Numerical study on ion energy control in a separate-electrode DF-CCP discharge
Keywords:
capacitive coupled plasma discharge, electrical assymetry effect, particle-in-cellAbstract
The effect of driving dual frequencies in a separate-Electrode dual-frequency capacitively coupled argon plasma discharge is investigated using a Particle-in-Cell with Monte Carlo Collisions (PIC-MCC) model. The frequency (13.56 MHz) is applied on one electrode, while the opposite electrode is powered by a variable frequency ranging from 27.12 MHz to 67.8 MHz. Our numerical results demonstrate that the combined electrical and geometric asymmetry effects enable quasi-independent control of ion bombardment energies at each electrode. Specifically, increasing the high frequency on the large-area electrode leads to a marked rise in the ion energy at the opposite, low-frequency powered small electrode, even as the DC self-bias voltage decreases. Furthermore, we find that the high-frequency powered electrode consistently sustains the highest ion energies, irrespective of its surface area.
References
[1] M. Lieberman and A. J. Lichtenberg. Principles of Plasma Discharges and Materials Processing. John Wiley and Sons, 2005.
[2] M. Kushner. Hybrid modelling of low temperature plasmas for fundamental investigations and equipment design. J. Phys. D: Appl. Phys., 42(194013), 2009. doi:10.1088/0022-3727/42/19/194013.
[3] T. Lafleur, P. Chabert, and J. Booth. Electron heating in capacitively coupled plasmas revisited. Plasma Sources Sci. Technol., 23(035010), 2014. doi:10.1088/0963-0252/23/3/035010.
[4] B. Heil, U. Czarnetski, R. Brinkmann, and T. Mussenbrock. On the possibility of making a geometrically symmetric rf-ccp discharge electrically asymmetric. J. Phys. D: Appl. Phys., 41(165202), 2008. doi:10.1088/0022-3727/41/16/165202.
[5] A. M. A. Boudghene Stambouli, R. Benallal, N. Oudini, et al. Control of dual frequency capacitively coupled plasma via blocking capacitor and phase angle. Eur. Phys. J. Appl. Phys, 80(10802), 2017. doi:10.1051/epjap/2017170180.
[6] J. Schulze, E. Schüngel, Z. Donkó, and U. Czarnetski. Charge dynamics in capacitively coupled radio frequency discharges. J. Phys. D: Appl. Phys., 43(225201), 2010. doi:10.1088/0022-3727/43/22/225201.
[7] J. Verboncoeur, M. Alves, V. Vahedi, and C. Birdsall. Simultaneous potential and circuit solution for 1d bounded plasma particle simulation codes. J.Comput. Phys., 104(321), 1993. doi:10.1006/jcph.1993.1034.
[8] V. Vahedi and G. DiPeso. Simultaneous potential and circuit solution for two-dimensional bounded plasma simulation codes. J. Comput. Phys., 131(149), 1997. doi:10.1006/jcph.1996.5591.
[9] I. Schweigert, D. Ariskin, T. Chernoiziumskaya, and A. Smirnov. Theoretical and experimental study of ion flux formation in an asymmetric radio-frequency capacitive discharge. Plasma Sources Sci. Technol., 20(015011), 2011. doi:10.1088/0963-0252/20/1/015011.
[10] J. Schulze, E. Schüngel, U. Czarnetski, et al. Making a geometrically asymmetric capacitive rf discharge electrically symmetric. Appl. Phys. Lett, 98(031501), 2011. doi:10.1063/1.3544541.
[11] Z. Donkó, J. Schulze, U. Czarnetski, and D. Luggenhölscher. Self-excited nonlinear plasma series resonance oscillations in geometrically symmetric capacitively coupled radio frequency discharges. Appl. Phys. Lett, 94(131501), 2009. doi:10.1063/1.3110056.
Downloads
Published
Issue
Section
License
Copyright (c) 2026 O. Hennane, A. M. A. Boudghene Stambouli, L. I. Karaouzène, R Benallal

This work is licensed under a Creative Commons Attribution 3.0 Unported License.
Authors who publish with this journal agree to the following terms:
- Authors retain copyright and grant the journal right of first publication with the work simultaneously licensed under a Creative Commons Attribution License that allows others to share the work with an acknowledgement of the work's authorship and initial publication in this journal.
- Authors are able to enter into separate, additional contractual arrangements for the non-exclusive distribution of the journal's published version of the work (e.g., post it to an institutional repository or publish it in a book), with an acknowledgement of its initial publication in this journal.
- Authors are permitted and encouraged to post their work online (e.g., in institutional repositories or on their website) prior to and during the submission process, as it can lead to productive exchanges, as well as earlier and greater citation of published work (See The Effect of Open Access).