Diagnostics of Plasma Pencil Discharge for Chemical Analysis

Authors

  • P. Slavíček Masaryk University
  • A. Hrdlicka Masaryk University
  • M. Dvorakova Masaryk University
  • V. Kanicky Masaryk University

DOI:

https://doi.org/10.14311/ppt.2019.1.95

Keywords:

plasma pencil, atmospheric pressure plasma, OES, chemical analysis

Abstract

We present diagnostics of plasma pencil discharge as alternative excitation source for analytical chemistry. The plasma pencil is special type of rf plasma nozzle at atmospheric pressure. Through this nozzle flows working gas argon with aerosol. The aerosol sample introduction system employed a double pass Scott spray chamber with a pneumatic concentric nebulizer. The parameters of the plasma were calculated by optical emission spectroscopy.

References

N. Bings, A. Bogaerts, and J. Broekaert. Atomic spectroscopy. Analytical Chemistry, 80:4317–4347, 2008. doi:10.1021/ac8006297.

T. Frentiu, M. Ponta, M. Senila, A. Mihaltan, E. Darvasi, and M. Frentiu. Evaluation of figures of merit for zn determination in environmental and biological samples using EDL excited AFS in a new radiofrequency capacitively coupled plasma. Journal of Analytical Atomic Spectrometry, 25:739–742, 2010. doi:10.1039/b918872j.

R. Gross, B. Platzer, E. Leitner, A. Schalk, H. Sinabel, H. Zach, and G. Knapp. Atomic emission gas chromatographic detection chemical and spectral interferences in the stabilized capacitive plasma (SCP). Spectrochimica Acta Part B, 47:95–106, 1992. doi:10.1016/0584-8547(92)80010-E.

J. Pedarnig, J. Heitz, E. Ionita, G. Dinescu, B. Praher, and R. Viskup. Combination of RF-plasma jet and laser-induced plasma for breakdown pectroscopy analysis of complex materials. Applied Surface Science, 257:5452–5455, 2011. doi:10.1016/j.apsusc.2010.11.112.

V. Mazakova, D. Trunec, and F. Krcma. Study of nitrogen flowing afterglow with mercury vapor injection.The Journal of Chemical Physics, 141:154307–1–154307–9, 2014. doi:10.1063/1.4898367.

V. Mazakova, D. Trunec, Z. Navratil, J. Raud, and F. Krcma. Study of argon-oxygen flowing afterglow. Plasma Sources Science and Technology, 25:1–10, 2016. doi:10.1088/0963-0252/25/3/035008.

J. Janca, M. Klima, P. Slavicek, and L. Zajickova. HF plasma pencil – new source for plasma surface processing. Surface and Coatings Technology, 116:547–551, 1999.

P. Slavicek, V. Bursikova, A. Brablec, V. Kapicka, and M. Klima. Deposition of polymer films by rf discharge at atmospheric pressure. Czechoslovak Journal of Physics, 54(3 Supp):C586, 2004. doi:10.1007/BF03166455.

L. Novosad, A. Hrdlicka, P. Slavicek, V. Otruba, and V. Kanicky. Plasma pencil as an excitation source for atomic emission spectrometry. Journal of Analytical Atomic Spectrometry, 27:0267–9477, 2012. doi:10.1039/c1ja10278h.

L. Novosad, A. Hrdlicka, P. Slavicek, V. Otruba, and V. Kanicky. Possibilities and analytical properties of the radiofrequency plasma pencil operating in the continuous and in the pulsed mode. Journal of Analytical Atomic Spectrometry, 30:459–467, 2015. doi:10.1039/c4ja00402g.

M. Dvorakova, A. Hrdlicka, P. Slavicek, V. Kanicky, and V. Otruba. Effects of easily ionisable elements on copper and zinc lines excited in a plasma pencil. Journal of Analytical Atomic Spectrometry, 31:2031–2036, 2016. doi:10.1039/c6ja00215c.

R. Korneva, P. Sennikov, L. Shabarova, A. Shishkin, T. Drozdova, and S. Sintsov. Reduction of boron trichloride in atmospheric-pressure argon-hydrogen radiofrequency induction plasma. High Energy Chemistry, 53:246–253, 2019. doi:10.1134/S001814391903010X.

Z. Navratil, D. Trunec, R. Smid, and L. Lazar. A software for optical emission spectroscopy - problem formulation and application to plasma diagnostics. Czechoslovak Journal of Physics, 56:B944–B951, 2006. doi:10.1007/s10582-006-0308-y.

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Published

2019-07-31

Issue

Vol. 6 No. 1 (2019)

Section

Articles

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