Application of RF (13.56 MHz) Arc Discharge for Plasma Chemical Conversion of Volatile Chlorides of Silicon and Germanium.


  • R. Kornev Institute of Chemistry of High-Purity Substances Russian Academy of Sciences
  • P. Sennikov Institute of Chemistry of High-Purity Substances Russian Academy of Sciences
  • V. Nazarov Institute of Chemistry of High-Purity Substances Russian Academy of Sciences Institute of Applied Physics of RAS
  • A. Sukhanov Institute of Chemistry of High-Purity Substances Russian Academy of Sciences
  • L. Shabarova Institute of Chemistry of High-Purity Substances Russian Academy of Sciences



RF arc discharge, reduction of volatile chlorides, simulation of gas-dynamic


The processes of hydrogen reduction of silicon and germanium chlorides are studied under RF conditions (40.68 MHz) of contracted atmospheric pressure arc discharge stabilized between two rod electrodes. The main gas-phase and solid products of plasma-chemical transformations are determined. Using the hydrogen reduction of SiCl4 as an example, the numerical simulation of gas-dynamic and heat exchange processes for this type of discharge was performed. The studies were carried out for the optimal conditions for obtaining trichlorosilane using modern computational technologies of fluid dynamics which made it possible to detail the velocity and temperature fields, the gas flow rates in the plasma region, and also determine the main temperature zones affecting the hydrogen reduction process.


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