Investigation of Silicon Wafers’ Influence on the Local Microwave Power Values in a Resonator-Type Plasmatron

S. Madveika, S. Bordusau, M. Lushakova, O. Tsikhan


The article concerns the investigation results of the ø100 mm silicon wafers' influence on the microwave power value fMW=2.45 ± 0.05 GHz in local points on the axis of a reaction-discharge chamber with the volume of about 9000 cm3 of a resonator-type plasmatron. The experiments were carried out in the conditions of the dynamic microwave power redistribution inside a volumetric resonator by using a moving dissector. To register microwave power in the plasma volume, the method of "the active probe" was used. It has been experimentally established that the decrease of distance between the silicon wafers results in the decrease of local microwave power values between them up to 50%. The investigation results of the silicon wafers' influence on the microwave power distribution structure in the gas discharge area indicate the presence of power distribution nonuniformity in the discharge area volume.


microwave plasma; silicon wafers; microwave power; plasmatron


S. Bordusov. Microwave plasma technologies in the production of electronic devices. Minsk: Bestprint, 2002.

Y. Lebedev. Microwave discharges at low pressures and peculiarities of the processes in strongly non-uniform plasma. Plasma Sources Science and Technology, 24(5):1–39, 2015. doi:10.1088/0963-0252/24/5/053001.

V. Batenin, I. Klimovsky, G. Lisov, and V. Troitski. Microwave Plasma Generators: Physics, Engineering, Applications. Moscow: EnergoAtomlzdat, 1988.

Y. Lebedev. The chemical activity of nonequilibrium plasma. state and perspectives of research. Chemical Physics, 15(5):96–100, 1996.

U. Kortshagen. Electron and ion distribution functions in RF and microwave plasmas. Plasma Sources Science and Technology, 4(4):172–182, 1995. doi:10.1088/0963-0252/4/2/002.

T. Nakano and S. Samukawa. The correlation between an electric field and the metastable chlorine ion density distributions in an ultrahigh-frequency plasma. Japanese Journal of Applied Physics, 37(5R):2686–2692, 1998. doi:10.1143/jjap.37.2686.

A. Didenko and B. Zverev. Microwave energetics. M.: Nauka, 2000.

S. Bordusau, S. Madveika, and A. Dostanko. Investigation of microwave energy distribution character in a resonator type plasmatron. Plasma Physics and Technology, 3(3):122–125, 2016.

S. Bordusau. Design features of the installation and processes of microwave plasma materials processing under low vacuum. Materials, technology, instruments,

(4):62–64, 2001.


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