On the Interaction of a Microwave Excited Oxygen Plasma with a Jet of Precursor Material for Deposition Applications

R. Methling, F. Hempel, M. Baeva, T. Trautvetter, H. Baierl, R. Foest


A plasma source based on a microwave discharge at atmospheric pressure is used to produce an oxygen plasma torch. An admixture of liquid precursor material is evaporated and injected into the torch through a nozzle, causing oxidization and deposition of doped silica at a nearby quartz substrate. The temperature generated inside the plasma source and in the plume, in the region of treatment, and at the substrate surface are key parameters, which are needed for process description and optimization of plasma-chemical reactions.

Optical emission spectroscopy, high-speed imaging, and thermography were applied to observe and to characterize the jet behavior and composition. The experimental results are compared with self-consistent modeling.


microwave plasma; plasma jet; optical emission spectroscopy; thermography


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