The Increase in Thickness Uniformity of Films Obtained by Magnetron Sputtering with Rotating Substrate

Authors

  • D. Golosov Belarusian State University of Informatics and Radioelectronics, P. Brovka, 6, 220013, Minsk
  • S. Melnikov Belarusian State University of Informatics and Radioelectronics, P. Brovka, 6, 220013, Minsk
  • S. Zavadski Belarusian State University of Informatics and Radioelectronics, P. Brovka, 6, 220013, Minsk
  • V. Kolos JSC "INTEGRAL", I.P. Kazintsa, 121A, 220108 Minsk
  • J. Okojie Belarusian State University of Informatics and Radioelectronics, P. Brovka, 6, 220013, Minsk

DOI:

https://doi.org/10.14311/ppt.2016.3.100

Keywords:

magnetron sputtering, deposition rate, film thickness, nonuniformity

Abstract

The titanium thin films obtained by magnetron sputtering with the rotating substrate at different distances between the substrate and magnetron centers were studied with regard to the uniformity of the film thickness distribution. On the basis of the experimental data obtained, the model for the magnetron film deposition during substrate rotation was developed. The analysis of the simulation results shows that the model error is not greater than 10%.

References

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Published

2016-02-13

Issue

Vol. 3 No. 3 (2016)

Section

Articles

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