Kovalchuk, N., Belarusian State University of Informatics and Radioelectronics, P.Brovki 6, 220013 Minsk, Belarus
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PLASMA PHYSICS AND TECHNOLOGY Vol. 4 No. 1 (2017) - Articles
The Influence of Microwave CF4 Plasma Activation on the Characteristics of Reactive Ion Etching of Mono-Si
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