Investigation of Microwave Energy Distribution Character in a Resonator Type Plasmatron
DOI:
https://doi.org/10.14311/ppt.2016.3.122Keywords:
plasma, microwave energy, distribution, resonator, plasmatronAbstract
An investigation of microwave energy distribution character in a plasma of microwave discharge inside a plasmatron based on a rectangular resonator has been carried out. The experiments were done applying the "active probe" method. Microwave discharge was excited in the air and oxygen. It has been found out that the readings of the "active probe" along the discharge chamber are of periodic character. The readings of the "active probe" and data on the local electric conductivity of plasma obtained using electrical probes have been compared.References
Yu.A. Lebedev. Microwave discharges at low pressures and peculiarities of the processes in strongly non-uniform plasma. Plasma Sourses Sci. Technol., 24(5):1–39, 2015.
Bordusov S.V. Microwave plasma technologies in the production of electronic devices. Minsk: Bestprint, 2002.
Mac-Donald A. Microwave Breakdown in Gases. Springer-Verlag, 1969.
Batenin V.M. Klimovski I.I. Lisov G.V. Troitski V.N. Microwave plasma generators: Physics, technology, application. M.: Energoatomizdat, 1988.
Dostanko A. Bordusov S. Svadkovski I. Plasma Processes in Electronics Production, volume 2. Minsk: FUAinform, 2001.
A.I. Kuzmichov. Ion-plasma sources based on microwave ovens. Instruments and experimental techniques, 27(5):648–653, 1995.
Plasma-Preen Plasma Cleaning/Etching System. http://www.plasmapreen.com.
Plasma-Preen Cleaner/Etcher (Patent Pending). http://www.terrauniversal.com.
Bordusau S.V. Madveika S.I. Dostanko A.P. Investigation of the microwave electromagnetic field attenuation effect in the discharge chamber of a resonant type plasmatron, 2012. http://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=6231952.
Nakano T. Samukawa S. The correlation between an electric field and the metastable chlorine ion density distributions in an ultrahigh-frequency plasma. Jap. J. Appl. Phys., 37(5):2686–2692, 1998.
S. Bordusov. Design features of the installation and processes microwave plasma materials processing under low vacuum. Materials, technology, instruments, 6(4):62–64, 2001.
Chernushenko A.M. Maiborodin A.V. Parameter measurement electronic devices decimeter and centimeter wave range. M.: Radio and Communication, 1986.
Bilko M.I. Tomaszewski A.K. Measurement of power in the microwave range. M.: Radio and Communication, 1986.
Yasaka Y. Nozaki D. Koga K. et al. Production of large-diameter plasma using multi-slotted planar antenna. Plasma Sources Sci. Technol, 8(4):530–533, 1999.
Mak P. Asmussen J. Experimental investigation of the matching and impressed electric field of a multipolar electron cyclotron resonance discharge. J. Vac. Sci. Technol. A., 15(1):154–168, 1997.
Zivotov V.K. Rusanov V.D. Fridman A.A. Diagnostics of nonequilibrium chemically active plasma. M.: Energoatomizdat, 1985.
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