Properties of Erbium Doped Hydrogenated Amorphous Carbon Layers Fabricated by Sputtering and Plasma Assisted Chemical Vapor Deposition

Authors

  • V. Prajzler
  • Z. Burian
  • V. Jeřábek
  • I. Hüttel
  • J. Špirková
  • J. Gurovič
  • J. Oswald
  • J. Zavadil
  • V. Peřina

DOI:

https://doi.org/10.14311/943

Keywords:

carbon layers, Erbium, PACVD, sputtering, photoluminescence

Abstract

We report about properties of carbon layers doped with Er3+ ions fabricated by Plasma Assisted Chemical Vapor Deposition (PACVD) and by sputtering on silicon or glass substrates. The structure of the samples was characterized by X-ray diffraction and their composition was determined by Rutherford Backscattering Spectroscopy and Elastic Recoil Detection Analysis. The Absorbance spectrum was taken in the spectral range from 400 nm to 600 nm. Photoluminescence spectra were obtained using two types of Ar laser (λex=514.5 nm, lex=488 nm) and also using a semiconductor laser (λex=980 nm). Samples fabricated by magnetron sputtering exhibited typical emission at 1530 nm when pumped at 514.5 nm. 

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Author Biographies

V. Prajzler

Z. Burian

V. Jeřábek

I. Hüttel

J. Špirková

J. Gurovič

J. Oswald

J. Zavadil

V. Peřina

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Published

2008-01-01

How to Cite

Prajzler, V., Burian, Z., Jeřábek, V., Hüttel, I., Špirková, J., Gurovič, J., Oswald, J., Zavadil, J., & Peřina, V. (2008). Properties of Erbium Doped Hydrogenated Amorphous Carbon Layers Fabricated by Sputtering and Plasma Assisted Chemical Vapor Deposition. Acta Polytechnica, 48(1). https://doi.org/10.14311/943

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