BORDUSAU, S.; MADVEIKA, S.; DOSTANKO, A. The Process of Plasma Chemical Photoresist Film Ashing from the Surface of Silicon Wafers. Acta Polytechnica, [S. l.], v. 53, n. 2, 2013. DOI: 10.14311/1725. Disponível em: https://ojs.cvut.cz/ojs/index.php/ap/article/view/1725. Acesso em: 7 may. 2024.