PÍCHAL, J.; KLENKO, J. Positioning of the Precursor Gas Inlet in an Atmospheric Dielectric Barrier Reactor, and its Effect on the Quality of Deposited TiOx Thin Film Surface. Acta Polytechnica, [S. l.], v. 53, n. 2, 2013. DOI: 10.14311/1767. Disponível em: https://ojs.cvut.cz/ojs/index.php/ap/article/view/1767. Acesso em: 2 may. 2024.