Píchal J, Klenko J. Positioning of the Precursor Gas Inlet in an Atmospheric Dielectric Barrier Reactor, and its Effect on the Quality of Deposited TiOx Thin Film Surface. Acta Polytech [Internet]. 2013 Jan. 2 [cited 2024 May 2];53(2). Available from: https://ojs.cvut.cz/ojs/index.php/ap/article/view/1767