Study of the Conversion of Carbon-containing and Organochlorine Impurities in the Process of Hydrogen Reduction of Silicon Tetrachloride by RF (40.68 MHz) Arc Discharge.
DOI:
https://doi.org/10.14311/ppt.2019.2.111Keywords:
RF arc discharge, conversion process of SiCl4 CCl4, thermodynamic analysisAbstract
A contracted RF (40.68 MHz) arc discharge of atmospheric pressure, stabilized between two rod electrodes, was used to obtain trichlorosilane by the reaction of hydrogen reduction of silicon tetrachloride (SiCl4). In model mixtures of macro-composition in the ratio H2/SiCl4/CCl4=10/1/1, it was shown that C and SiC are the main solid-phase product which are deposited on the surface of electrodes in the form of dendrides. The temperature of the ends of the electrodes determined using emission thermometry is 1600 K. The thermodynamic analysis of H2+SiCl4+CCl4 system confirms that the formation of C and SiC occurs in the temperature range of 1600 K. The deposition of solid-phase products occurs on the electrodes in the zone of high electric field strength.References
A. V. Gusev, R. A. Kornev, and A. Y. Sukhanov. Preparation of trichlorosilane by plasma hydrogenation of silicon tetrachloride. Inorganic Materials, 42(9):1023–1026, 2006. doi:10.1134/S0020168506090172.
R. A. Kornev, V. A. Shaposhnikov, and A. M. Kuz’min. Gas-dynamic and thermal processes in the synthesis of trichlorosilane by hydrogen reduction of silicon tetrachloride in a high-frequency discharge. Russian Journal of Applied Chemistry, 87(9):1246–1250, 2005. doi:10.1134/S1070427214090079.
A. G. Bubnov, V. I. Grinevich, and V. V. Kostrov. High energy chemistry, 25(4):365–371 (in Russian), 1991.
I. Pazinkevich. Abstract of papers. In 11th Int. Gas Congress, Moscow, page 19 (in Russian), 1970.
L. Mochalov, R. Kornev, A. Logunov, and et al. Behavior of carbon-containing impurities in the prrocess of plasma-chemical distillation of sulfur. Plasma Chemistry and Plasma Processing, 38:387–598, 2018. doi:10.1007/s11090-018-9879-1.
A. V. Gusev, R. A. Kornev, and A. Y. Sukhanov. Behavior of organochlorine impurities in the process of plasma-enhanced synthesis of trichlorosilane. High Energy Chemistry, 42(4):324–325, 2008.
A. V. Gusev, R. A. Kornev, and A. Y. Sukhanov. Behavior of carbon-containing impurities during plasma synthesis of trichlorosilane. High Energy Chemistry, 42(1):56–58, 2008. doi:10.1134/S0018143908010116.
Y. P. Raizer. Gas Discharge Physics. Springer, Berlin, 1991.
R. A. Kornev, P. G. Sennikov, and V. V. Nazarov. Application of RF (13.56 MHz) arc discharge for plasma chemical conversion of volatile fluorides. Plasma Physics and Technology, 4(2):169–172, 2017. doi:10.14311/ppt.2017.2.169.
A. N. Magunov. Temperature measurement of objects with unknown emissivity by spectral pyrometry. Scientific instrument engineering, 20(3):22–26 (in Russian), 2010.
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