Madveika , S. I., Belarus
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PLASMA PHYSICS AND TECHNOLOGY Vol. 1 No. 3 (2014) - Articles
High Rate Removal of Photoresist Films in the Microwave Discharge Afterglow in Oxygen
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PLASMA PHYSICS AND TECHNOLOGY Vol. 2 No. 1 (2015) - Articles
Investigation of the Process of Microwave Plasma Ashing of Photoresist Films from Semiconductor Wafers Using the Method of Optical Emission Spectroscopy
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PLASMA PHYSICS AND TECHNOLOGY Vol. 2 No. 2 (2015) - Articles
Theoretical Analysis of Low Vacuum Microwave Discharge Exciting and Maintaining Conditions in Resonator Type Plasmatron
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