Madveika , S. I., Bělorusko

• PLASMA PHYSICS AND TECHNOLOGY Vol 1 No 3 (2014) - Articles
  High Rate Removal of Photoresist Films in the Microwave Discharge Afterglow in Oxygen
  Abstrakt  PDF (English)
• PLASMA PHYSICS AND TECHNOLOGY Vol 2 No 1 (2015) - Articles
  Investigation of the Process of Microwave Plasma Ashing of Photoresist Films from Semiconductor Wafers Using the Method of Optical Emission Spectroscopy
  Abstrakt  PDF (English)
• PLASMA PHYSICS AND TECHNOLOGY Vol 2 No 2 (2015) - Articles
  Theoretical Analysis of Low Vacuum Microwave Discharge Exciting and Maintaining Conditions in Resonator Type Plasmatron
  Abstrakt  PDF (English)