Bordusau , S.V., Belarus

• PLASMA PHYSICS AND TECHNOLOGY Vol. 1 No. 1 (2014) - Articles
  Express Method for Diagnosing Microwave Plasmatron Work Stability within the Range of Plasma-Inducing Gas Pressures
  Abstract  PDF
• PLASMA PHYSICS AND TECHNOLOGY Vol. 1 No. 3 (2014) - Articles
  High Rate Removal of Photoresist Films in the Microwave Discharge Afterglow in Oxygen
  Abstract  PDF
• PLASMA PHYSICS AND TECHNOLOGY Vol. 2 No. 1 (2015) - Articles
  Investigation of the Process of Microwave Plasma Ashing of Photoresist Films from Semiconductor Wafers Using the Method of Optical Emission Spectroscopy
  Abstract  PDF
• PLASMA PHYSICS AND TECHNOLOGY Vol. 2 No. 2 (2015) - Articles
  The Device for Dynamic Matching of the E-type Discharge Plasma System and Output Tract of Electric Pulses Generator
  Abstract  PDF
• PLASMA PHYSICS AND TECHNOLOGY Vol. 2 No. 2 (2015) - Articles
  Theoretical Analysis of Low Vacuum Microwave Discharge Exciting and Maintaining Conditions in Resonator Type Plasmatron
  Abstract  PDF