Bordusau, S.V., Bělorusko

• PLASMA PHYSICS AND TECHNOLOGY Vol 1 No 1 (2014) - Articles
  Express Method for Diagnosing Microwave Plasmatron Work Stability within the Range of Plasma-Inducing Gas Pressures
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• PLASMA PHYSICS AND TECHNOLOGY Vol 1 No 3 (2014) - Articles
  High Rate Removal of Photoresist Films in the Microwave Discharge Afterglow in Oxygen
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• PLASMA PHYSICS AND TECHNOLOGY Vol 2 No 1 (2015) - Articles
  Investigation of the Process of Microwave Plasma Ashing of Photoresist Films from Semiconductor Wafers Using the Method of Optical Emission Spectroscopy
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• PLASMA PHYSICS AND TECHNOLOGY Vol 2 No 2 (2015) - Articles
  The Device for Dynamic Matching of the E-type Discharge Plasma System and Output Tract of Electric Pulses Generator
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• PLASMA PHYSICS AND TECHNOLOGY Vol 2 No 2 (2015) - Articles
  Theoretical Analysis of Low Vacuum Microwave Discharge Exciting and Maintaining Conditions in Resonator Type Plasmatron
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